X40 | Physical Sciences Tutorial | Flash Electropolishing for Removing FIB-Induced Artifacts in Metallic TEM Specimens
Wednesday, July 30, 2025
8:30 AM - 10:00 AM MT
Location: 254 A
Topics Include:
Flash electropolishing (FP) in milliseconds removes the Ga induced damage layer from FIB lift outs of fusion and fission materials, revealing the true irradiation defect structure for high fidelity TEM analysis.
The tutorial will showcase ongoing FP research in Dr. Yuanyuan Zhu’s group at the University of Connecticut, including recent results on pristine tungsten.
I will dissect the end to end workflow—lift out preparation, grid selection, welding, post polish inspection, and transfer to MEMS e chips—for in situ TEM experiments.
Practical guidance will cover electrolyte freshness, polishing rate control, and systematic recipe development to achieve artifact free samples.
