Materials Analysis Division, Manager
Taiwan Semiconductor Research Institute
Hsinchu, United States
Kun-Lin Lin received his M.S. and Ph.D. degrees in Materials Science and Engineering from National Chiao-Tung University, Hsinchu, Taiwan, in 2001 and 2005, respectively. From 2006 to 2008, he served as a Postdoctoral Researcher at National Chiao-Tung University and National Taiwan University of Science and Technology, Taipei, Taiwan. During this period, he conducted microstructural characterization of metal/ceramic interfaces using transmission electron microscopy (TEM). From 2008 to 2010, he worked in the Physical Failure Analysis Department at Inotera Memories Inc., Taoyuan, Taiwan, focusing on TEM analysis of dynamic random-access memory (DRAM). Since May 2010, he has been an Associate Researcher at the National Nano Device Laboratories, which was renamed the Taiwan Semiconductor Research Institute in 2018, Hsinchu, Taiwan. His research interests include TEM analysis for materials characterization, with recent work focusing on microstructural characterization of doped semiconductors using Differential Hall Effect Metrology (DHEM) and Atom Probe Tomography (APT).
Disclosure information not submitted.
Tuesday, July 29, 2025
11:00 AM - 11:15 AM MT